After the copper was etched the pmma pva graphene block was rinsed with deionized water three times at 0 c and transferred onto a 100 nm thick sio 2 si substrate.
Cvd graphene copper etching.
Wei guo feng jing jian xiao ce zhou yuanwei lin shuai wang.
2a and b show the etching time evolution of the graphene domain size on the copper foils etched by an fecl 3 or an nh 4 2 s 2 o 8 etchant.
We report a simple clean and highly anisotropic hydrogen etching method for chemical vapor deposited cvd graphene catalyzed by the copper substrate.
Figure 4 shows the raman spectra of the cvd grown bilayer graphene transferred onto pet wafers using the three different etching solutions.
In addition we found that the etching is temperature dependent.
Advanced materials 2016 28 29 6247 6252.
Here to investigate the size and density of the graphene domains the cvd growth of graphene was terminated by stopping the ch 4 feedstock prior to covering the entire cu surface.
Synthesis of graphene films on copper foils by chemical vapor deposition.
For the fecl 3 etchant we found that the average size of the.
By exposing cvd graphene on copper foil to hydrogen flow around 800 c we observed that the initially continuous graphene can be etched to have many hexagonal openings.